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RAITH Micrograph Award 2021
Congratulations to Sedighe Salimian and Isha Verma for their honorable mentions at the RAITH Micrograph Award 2021 – Special Edition, one of the most important award in the world on e-beam lithography.

Congratulations to Sedighe Salimian and Isha Verma for their honorable mentions at the RAITH Micrograph Award 2021 – Special Edition, one of the most important award in the world on e-beam lithography!

 

Sedighe Salimian, young researcher at Cnr NANO and the NEST Lab won the Honorable Mention for her image ‘Charge carrier separation in InAs/InP/GaAsSb core-dualshell based multifunctional device’. [pictured above].

Isha Verma, Scuola Normale Superiore PhD student at NEST Lab and collaborating with Cnr NANO, won the Honorable Mention with two images called: ‘High-Mobility Free-Standing InSb Nanoflags grown on InP Nanowire Stems for Quantum Devices’ and ‘Growth of InP nanowires via selective area epitaxy for single photon emission’. [pictured below]

 

“We have never seen so many high-quality contributions as we have with this award” say at Raith, a world leading manufacturer of nanofabrication instruments. “So instead of announcing winners of an Art Award, this time we decided to replace that category with an “Honorable Mention” category in recognition of the high-quality work shown in the pictures and in the descriptions we received.”

Growth of InP nanowires via selective area epitaxy for single photon emission - Isha Verma, NEST Lab
'High-Mobility Free-Standing InSb Nanoflags grown on InP Nanowire Stems for Quantum Devices' Isha Verma, NEST Lab

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